MDW Stainless Steel Vortex Magnetic Pump
Product Overview
The MDW stainless steel vortex magnetic pump is engineered for high-pressure, high- and low-temperature circulation duties where compact size and zero leakage are required at the same time. The vortex hydraulic end delivers high head at low flow, with rated heads from 15 m to 220 m and capacities from 0.5 to 12 m³/h, while the seal-less magnetic drive with a high-strength, wear-resistant isolation sleeve keeps the process fluid behind a static containment shell across a media window of −196 °C to +400 °C. Forward and reverse transfer capability allows the pump to fill and drain circuits with one machine, which simplifies loop design in test and temperature control systems. In semiconductor manufacturing, the MDW serves precision temperature control loops for wafer polishing and cleaning, CMP temperature conditioning, thin-film deposition equipment, etching system cooling, and packaging and test handlers. The stainless steel wetted path, static sealing, and stable low-flow hydraulics match the purity and repeatability demands of fab auxiliary systems. In AI and high-density computing infrastructure, the pump circulates water-glycol mixtures and secondary-side coolants in direct-to-chip liquid cooling loops, coolant distribution units (CDUs), and thermal test benches, where continuous-duty reliability and precise pressure control at low flow determine rack-level thermal stability.
Product Features
- The impeller adopts a highly wear-resistant surface treatment process
- Capable of forward and reverse fluid transfer for fill-and-drain loop operation
- High-pressure resistant technology
- High-strength and wear-resistant technology for isolation sleeves
- Multiple spindle configurations available for high-temperature and high-pressure conditions
- Contamination-free stainless steel fluid path with static sealing for semiconductor process media
- Stable low-flow, high-head hydraulics rated to 220 m for precision TCU, chiller, and CMP temperature control loops
- Rated for water-glycol mixtures used in AI data center direct-to-chip liquid cooling
Technical Specifications
| Model | Diameter | Motor | Performance Parameter | Pump Weight (kg) | ||||||
|---|---|---|---|---|---|---|---|---|---|---|
| Inlet | Outlet | Power (kW) | (Hp) | Voltage (V) | Frequency (Hz) | Speed (r/min) | Max/Rated Head (m) | Max Capacity (L/min) | ||
| MDW-024 | DN15 | DN15 | 0.18 | 0.24 | 3ø-380 | 50 | 2760 | 15/10 | 15 | 7.5 |
| MDW-033 | DN15 | DN15 | 0.25 | 0.33 | 3ø-380 | 50 | 2760 | 20/12 | 15 | 9 |
| MDW-05 | DN15 | DN15 | 0.37 | 0.5 | 3ø-380 | 50 | 2760 | 30/20 | 30 | 9.5 |
| MDW-07 | DN15 | DN15 | 0.5 | 0.7 | 3ø-380 | 50 | 2760 | 40/30 | 25 | 10 |
| MDW-07T | G1/2" | G1/2" | 0.5 | 0.7 | 3ø-380 | 50 | 2760 | 50/40 | 40 | 10 |
| MDW-10H | DN15 | DN15 | 0.75 | 1 | 3ø-380 | 50 | 2760 | 75/50 | 30 | 10 |
| MDW-10 (T) | DN20 | DN20 | 0.75 | 1 | 3ø-380 | 50 | 2760 | 45/30 | 45 | 10 |
| MDW-15 (T) | DN20 | DN20 | 1.1 | 1.5 | 3ø-380 | 50 | 2760 | 60/40 | 60 | 17 |
| MDW-23 (T) | DN25 | DN25 | 1.7 | 2.3 | 3ø-380 | 50 | 2760 | 65/50 | 90 | 22 |
| MDW-33 (T) | DN25 | DN25 | 2.5 | 3.3 | 3ø-380 | 50 | 2760 | 90/60 | 90 | 26 |
| MDW-40 | DN25 | DN25 | 3 | 4 | 3ø-380 | 50 | 2900 | 100/70 | 100 | 35 |
| MDW-50 (E) | DN32 | DN32 | 4 | 5 | 3ø-380 | 50 | 2900 | 90/70 | 200 | 55 |
| MDW-75E | DN40 | DN40 | 5.5 | 7.5 | 3ø-380 | 50 | 2900 | 220/130 | 106 | 60 |
*The above characteristic testing is based on water transfer at normal speed under 20°C. The performance parameter error is approximately ±10%. Pump performance varies depending on the proportion and density of the liquid medium.
Pump Structure
The MDS Pump production structure consists of the Pump Cover, Spindle, Impeller, Pump Body, Axle Sleeve, Packing Ring, Inside Magnet, Isolation Cover, Outside Magnet, and Motor, forming a wear-resistant leak-proof cryogenic and high-temperature fluid transfer assembly.
Performance Curve
The MDS Pump production structure consists of the Pump Cover, Spindle, Impeller, Pump Body, Axle Sleeve, Packing Ring, Inside Magnet, Isolation Cover, Outside Magnet, and Motor, forming a wear-resistant leak-proof cryogenic and high-temperature fluid transfer assembly.
Working Condition
| Medium Temperature | Medium Density | Ambient Temperature | Maximum Elevation | Max Withstand Pressure |
|---|---|---|---|---|
| -196°C ~ +400°C | 0.6 ~ 2.0 | -50°C ~ +70°C | 5000m | 70bar |
Application Area
The MDW is specified across four application groups where extreme temperature, zero leakage, and low-flow high-head performance intersect.
Semiconductor Manufacturing
Precision temperature control and media circulation for wafer polishing and cleaning lines, CMP (chemical mechanical planarization) temperature conditioning, thin-film deposition equipment (CVD/PVD), etching system cooling, and packaging and test handlers including thermal chucks and thermal stream systems. The seal-less static containment and stainless steel wetted path protect high-purity process media from contamination and the fab environment from leakage.
AI and Data Center Cooling
Secondary-side circulation in direct-to-chip liquid cooling, coolant distribution units (CDUs), rack manifolds, and thermal test benches for AI servers and high-density computing. The pump handles water-glycol mixtures at stable low-flow pressure, and its forward/reverse capability supports fill, drain, and purge operations during commissioning and maintenance of cooling loops.
Temperature Control Systems
High-temperature mold temperature control, high-low temperature test chambers and instruments, template and mold/plate temperature control systems, TCU (Temperature Control Unit) skids, and ultrasonic cleaning equipment.
Chemical and Process Industries
Chemical processing equipment, high-end printing and dyeing equipment, and other mid-to-high-end circulation duties requiring high head in a compact footprint.
Product Certification
